New Lithography Meeting
The new SPIE symposium, 4-6 November in Taipei, Taiwan, will host five conferences on the latest developments in microlithography techniques, nanofabrication, resist materials, process control, and semiconductor manufacturing.
The conference is chaired by Alek C. Chen of ASML Taiwan Ltd., with co-chairs Burn Lin and Anthony Chen, both from Taiwan Semiconductor Manufacturing Co. Ltd.
Courses relevant to the conference program and to the lithography industry will also be offered to conference attendees.
A poster session and reception at 6 p.m. on 4 November is open to all attendees.
For more information, visit the SPIE Lithography Asian-Taiwan symposium site.
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