Andreas Erdmann on attenuated phase shift masks

Emily Gallagher is a principal researcher at imec and an associate editor for the Journal of Micro/Nanopatterning, Materials, and Metrology (JM3). In this video, she interviews Andreas Erdmann, head of the Fraunhofer IISB Computational Lithography and Optics Group, about a recent review paper he published in JM3.

Authored with Hazem Mesilhy and Peter Evanschitzky, the paper, “Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?,” appears in the April-June 2022 issue of the journal. In the interview, Erdmann discusses efforts to push EUV to its optical resolution limits, how a new level of source and mask optimization might be possible, and new work on a metasurface for white light optics.

Watch the full-length interview in the October-December 2022 issue of JM3.