Past Event Overview
SPIE Scanning Microscopies, a multidisciplinary conference for advancing scanning microscopy technologies and applications. This event brings microscopists from all phase of scanning microscopies (from scanned optics to scanned particle beams) together in a single forum to discuss current research and new advancements in the field.
| Review the 2015 Program | ||
| • | News and photos | |
| • | Final Technical Program (3 MB PDF) | |
| • | Technical Abstracts (1 MB PDF) | |
| 2015 Keynote Presentation | |
| Lithography and Mask Challenges at the Leading Edge Harry J. Levinson | |
| 2015 Topics | ||
| • | Optical, Particle Beam (ion and electron), and Scanned Probe | |
| • | Forensics | |
| • | Biological and Pharmaceutical | |
| • | Food Analysis: Microstructure, Identification, and Counterterrorism | |
| • | Environment, Health, and Safety | |
| • | Nanofabrication and Nanolithography | |
| • | Photomask Imaging, Metrology, and Characterization | |
| • | Nanomaterials | |
| • | Instrument Calibration, Evaluation, and Standards | |
| • | Industrial Semiconductor Applications | |
| Co-located with SPIE Photomask Technology 2015 | ||
| SPIE Scanning Microscopies is co-located with SPIE Photomask Technology 2015, the premier worldwide technical meeting for the photomask industry. Two conferences for one registration, plus access to multidisciplinary connections and information. | ||
| SPIE Photomask Technology Monterey Conference Center and Monterey Marriott Monterey, California, United States 29 September - 1 October 2015 | ||