Past Event Overview
SPIE Scanning Microscopies, a multidisciplinary conference for advancing scanning microscopy technologies and applications. This event brings microscopists from all phase of scanning microscopies (from scanned optics to scanned particle beams) together in a single forum to discuss current research and new advancements in the field.
| View registration pricing and details |
| 2014 Program Overview | |
| • | Final Technical Program (3 MB PDF) |
| • | Technical Abstracts (300 KB PDF) Scanning Microscopies only |
Keynote Presentation
| | Many ways to shrink: The right moves to 10 nanometer and beyond |
With mobile devices such as smartphones outpacing other market segments, the demand for low-power chips, enabled by continued device shrink, continues to be strong. The semiconductor industry’s drive to innovate is relentless, R&D pipelines are filled, and IC manufacturers have multiple options to continue scaling. This presentation will examine the different technology options for the 10 nanometer node and beyond.
| More than 50 presentations in these areas | ||
| • | Optical, Particle Beam (ion and electron), and Scanned Probe | |
| • | Forensics | |
| • | Biological and Pharmaceutical | |
| • | Food Analysis: Microstructure, Identification, and Counterterrorism | |
| • | Environment, Health, and Safety | |
| • | Nanofabrication and Nanolithography | |
| • | Photomask Imaging, Metrology, and Characterization | |
| • | Nanomaterials | |
| • | Instrument Calibration, Evaluation, and Standards | |
| • | Industrial Semiconductor Applications | |
| Co-located with SPIE Photomask Technology 2014 | ||
| New in 2014 - SPIE Scanning Microscopies was co-located with SPIE Photomask 2014, the premier worldwide technical meeting for the photomask industry. Two conferences for one registration, plus access to multidisciplinary connections and information. | ||
| SPIE Photomask Technology Monterey Conference Center and Monterey Marriott Monterey, California, United States 16 - 18 September 2014 | ||