Past Event Overview
Thank you for attending SPIE Photomask Technology 2016, the premier worldwide technical meeting for mask making, emerging mask technologies, and mask business.
| Download the 2016 materials | |
| • | Final Program (2 MB PDF) |
| • | Technical Abstracts (3 MB PDF) |
| • | Exhibition Guide (2 MB PDF) |
| 2016 Topics | ||
| Mask Making: Mask data preparation • Substrates, materials, pellicles • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making | ||
| Anamorphic Masks for High-NA EUV: Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design | ||
| Emerging & Alternate Mask Technologies: EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML² | ||
| EUV pellicles: Nanoimprint mask making • Nanoimprint mask applications • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML² • Masks for flat panel displays • Masks for MEMs | ||
| Mask Business: Mask manufacturing control • Reticle management in the fab and mask shop • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges |
| 2016 Keynote Presentation | |
| Making Lithography Great Christopher Progler | |
| Review the 2015 Program | ||
| • | News and photos | |
| • | Final Technical Program (5 MB PDF) | |
| • | 2015 Exhibition Guide (3 MB PDF) | |
| • | Technical Abstracts (1 MB PDF) | |
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