Past Event Overview
SPIE Photomask Technology 2015, the premier worldwide technical meeting for mask making, emerging mask technologies, and mask business.
| Review the 2015 Program | ||
| • | News and photos | |
| • | Final Technical Program (5 MB PDF) | |
| • | 2015 Exhibition Guide (3 MB PDF) | |
| • | Technical Abstracts (1 MB PDF) | |
| 2015 Keynote Presentation | |
| Lithography and Mask Challenges at the Leading Edge Harry J. Levinson | |
| 2015 Topics | ||
| Mask Making: Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making | ||
| Anamorphic Masks for High-NA EUV: Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design | ||
| Emerging Mask Technologies: EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML² | ||
| Mask Business: Mask manufacturing control • Mask shop management • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges |
| Co-located with SPIE Scanning Microscopies 2015 | ||
| SPIE Photomask Technology is co-located with SPIE Scanning Microscopies 2015, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Two conferences for one registration, plus access to multidisciplinary connections and information. | ||
| SPIE Scanning Microscopies Monterey Conference Center and Monterey Marriott Monterey, California, United States 29 September - 1 October 2015 | ||