Past Event Overview
SPIE Photomask Technology 2014, the premier worldwide technical meeting for the photomask industry. We look forward to SPIE Photomask Technology 2015.
View registration pricing and details |
2014 Program Overview | |
• | Final Technical Program (3 MB PDF) |
• | Technical Abstracts (300 KB PDF) Photomask only |
• | Press Release and Event Photos |
Keynote Presentation
| Many ways to shrink: The right moves to 10 nanometer and beyond |
With mobile devices such as smartphones outpacing other market segments, the demand for low-power chips, enabled by continued device shrink, continues to be strong. The semiconductor industry’s drive to innovate is relentless, R&D pipelines are filled, and IC manufacturers have multiple options to continue scaling. This presentation will examine the different technology options for the 10 nanometer node and beyond.
Co-located with SPIE Scanning Microscopies 2014 | ||
New in 2014 - SPIE Photomask Technology was co-located with SPIE Scanning Microscopies 2014, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Two conferences for one registration, plus access to multidisciplinary connections and information. | ||
SPIE Scanning Microscopies Monterey Conference Center and Monterey Marriott Monterey, California, United States 16 - 18 September 2014 |