Past Event Overview
SPIE Photomask Technology 2011 was the premier conference and exhibition for EUV mask making, emerging mask technologies, and the entire photomask industry: sponsored by SPIE and BACUS.
Program Information:
• | Final Program (PDF) |
• | Technical abstracts (PDF) |
Keynote Presentation
|
SPIE Photomask 2011
included over 170 presentations on:
Mask Making Topics include: mask data preparation, substrates and materials, patterning tools and processes, resist and resist processing, etch techniques, metrology, inspection, repair, cleaning, contamination, and haze, simulation of mask making. | |
Emerging Mask Technologies Topics include: EUV mask making, inspection and repair, and infrastructure. Nano imprint mask making and applications. Pixellated masks, alternative mask technologies, mask process correction, grey scale masks, direct write, ML². | |
Mask Application Topics include: Double- and multi-patterning, resolution enhancement techniques and OPC, source and mask optimization, design for manufacturability, patterned media, simulation and modeling. | |
Mask Business Mask manufacturing control, mask shop management, mask management in wafer fabs, business aspects of mask, infrastructure. |
One registration fee gave you access to:
• | Over 170 papers in mask-making technologies |
• | Keynote presentations and special sessions |
• | A 20-plus company Exhibition |
• | An evening reception with great entertainment |