The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance hear the latest research on the emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.

• 1,100 Attendees
• 46 Exhibitors
• 200 Technical Papers

Highlights from Photomask 2008:

• View Photomask Final Program PDF
• View 2008 Participant List