Past Event Overview

The second SPIE Lithography Asia conference featured presentations from leading researchers, developers, and innovators, and built on last year’s very successful conference.
View 2009 program details:
•Event Slideshow (PowerPoint)
•Printable Final Technical Program (PDF)
•Technical Program online
•Complete Conference Abstracts (PDF)
Attendees enjoyed the outstanding plenary presentations from these industry leaders:
•Dr. Burn Lin, Senior Director, TSMC
•Dr. Kinam Kim, Executive VP and General Manager of R&D, Samsung
•Dr. Christopher J. Progler, Chief Technology Officer, Photronics, Inc.
•Dr. Cheng-Wen Wu, Director, ETRI Taiwan

Symposium Chairs:


Alek C. Chen
ASML Taiwan Ltd.


Woo-Sung Han
Samsung Electronics Co. Ltd.


Burn Lin
Taiwan Semiconductor
Manufacturing Co. Ltd.
Anthony Yen
Taiwan Semiconductor
Manufacturing Co. Ltd.

Conference topics include:

Emerging Lithographic Technology and Nanofabrication

 
  • Optical lithography extension (shorter than 157 nm)
    •  
  • EUV lithography
    •  
  • E- and ion- beam technology
    •  
  • Nano-imprint lithography
    •  
  • Application on nanostructures

    • Optical Microlithography

     
  • ArF immersion lithography
    •  
  • RET technology
    •  
  • Double exposure/double patterning lithography
    •  
  • OPC modeling
    •  
  • Photo cluster automation

    • Advances in Resist Material and Processing

     
  • Emerging resist materials
    •  
  • Advancement in immersion resists
    •  
  • Resist process optimizations
    •  
  • Resist material for LCD application
    •  
  • Double exposure material

    • Metrology, Inspection, and Process Control

     
  • Advancement in CD metrology
    •  
  • Advancement in overlay metrology
    •  
  • Advancement in defect inspection
    •  
  • Process control for CD and overlay
    •  
  • Emerging metrology technology

    • LCD Application

     
  • Imaging technology
    •  
  • Process control
    •  
  • Material technology
    •  
  • Automation and productivity


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