Past Event Overview

The second SPIE Lithography Asia conference featured presentations from leading researchers, developers, and innovators, and built on last year’s very successful conference.
View 2009 program details:
Event Slideshow (PowerPoint)
Printable Final Technical Program (PDF)
Technical Program online
Complete Conference Abstracts (PDF)
Attendees enjoyed the outstanding plenary presentations from these industry leaders:
Dr. Burn Lin, Senior Director, TSMC
Dr. Kinam Kim, Executive VP and General Manager of R&D, Samsung
Dr. Christopher J. Progler, Chief Technology Officer, Photronics, Inc.
Dr. Cheng-Wen Wu, Director, ETRI Taiwan

Symposium Chairs:


Alek C. Chen
ASML Taiwan Ltd.


Woo-Sung Han
Samsung Electronics Co. Ltd.


Burn Lin
Taiwan Semiconductor
Manufacturing Co. Ltd.

Anthony Yen
Taiwan Semiconductor
Manufacturing Co. Ltd.


Conference topics include:

Emerging Lithographic Technology and Nanofabrication

 
  • Optical lithography extension (shorter than 157 nm)
  •  
  • EUV lithography
  •  
  • E- and ion- beam technology
  •  
  • Nano-imprint lithography
  •  
  • Application on nanostructures
  • Optical Microlithography

     
  • ArF immersion lithography
  •  
  • RET technology
  •  
  • Double exposure/double patterning lithography
  •  
  • OPC modeling
  •  
  • Photo cluster automation
  • Advances in Resist Material and Processing

     
  • Emerging resist materials
  •  
  • Advancement in immersion resists
  •  
  • Resist process optimizations
  •  
  • Resist material for LCD application
  •  
  • Double exposure material
  • Metrology, Inspection, and Process Control

     
  • Advancement in CD metrology
  •  
  • Advancement in overlay metrology
  •  
  • Advancement in defect inspection
  •  
  • Process control for CD and overlay
  •  
  • Emerging metrology technology
  • LCD Application

     
  • Imaging technology
  •  
  • Process control
  •  
  • Material technology
  •  
  • Automation and productivity