Past Event Overview

SPIE would like to thank everyone involved with SPIE Lithography Asia—Taiwan 2008. Thank you for your support and participation!

SPIE Lithography Asia 2008 featured presentations from leading researchers, developers, and innovators. The latest research on semiconductor device technologies was presented.• Final Conference Program (PDF)

Information on Lithography Asia 2009 will be available in early 2009.

Conference chairs:

Alek C. Chen
ASML Taiwan Ltd.
Conference Chair		Burn Lin
Taiwan Semiconductor Manufacturing Co. Ltd.
Conference Cochair		Anthony Yen
Taiwan Semiconductor Manufacturing Co. Ltd.
Conference Cochair

Conference topics included:

Emerging Lithographic Technology and Nanofabrication

 
  • Optical lithography extension (shorter than 157 nm)
    •  
  • EUV lithography
    •  
  • E- and ion- beam technology
    •  
  • Nano-imprint lithography
    •  
  • Application on nanostructures

    • Optical Microlithography

     
  • ArF immersion lithography
    •  
  • RET technology
    •  
  • Double exposure/double patterning lithography
    •  
  • OPC modeling
    •  
  • Photo cluster automation

    • Advances in Resist Material and Processing

     
  • Emerging resist materials
    •  
  • Advancement in immersion resists
    •  
  • Resist process optimizations
    •  
  • Resist material for LCD application
    •  
  • Double exposure material

    • Metrology, Inspection, and Process Control

     
  • Advancement in CD metrology
    •  
  • Advancement in overlay metrology
    •  
  • Advancement in defect inspection
    •  
  • Process control for CD and overlay
    •  
  • Emerging metrology technology

    • LCD Application

     
  • Imaging technology
    •  
  • Process control
    •  
  • Material technology
    •  
  • Automation and productivity

    		•