Past Event Overview
Thanks for attending SPIE Advanced Lithography 2012, the world's premier semiconductor lithography conference and exhibition.
The 2012 event ended Thursday 16 February, after a five-day run in beautiful San Jose, California.
Read news, and check out photos, from this event
THE 2012 PROGRAM | ||
• | View Final Program (PDF) | |
• | View Technical Abstracts (PDF) | |
• | View Exhibition Guide (PDF) |
More than 600 presentations highlighted the latest research
• | Advanced Etch Technology for Nanopatterning | |
• | Extreme Ultraviolet (EUV) Lithography | |
• | Alternative Lithographic Technologies | |
• | Metrology, Inspection, and Process Control for Microlithography | |
• | Advances in Resist Materials and Processing Technology | |
• | Optical Microlithography | |
• | Design for Manufacturability through Design-Process Integration |
2012 PLENARY SPEAKERS | ||
| Jim Clifford The Mobile Wireless Phenomenon: A Continued Need for Advanced Lithography | |
| C. Grant Willson High-Resolution Patterning: A View of the Future | |
| Christopher J. Progler Squares Do Not Make Good Frisbees | |
Plenaries sponsored by: |